CMPP
CMPP CMP slurry-filter cartridges
For control of oversized particles and agglomerates in CMP slurries, evaluated together with useful-abrasive retention and pressure rise.
Specifications & documents ↗FILTRATION / Depth Cartridges
CMP Depth Cartridges
Evaluate agglomerate control alongside useful abrasive retention, rather than selecting by nominal rating alone.
- Product type
- Depth Cartridges
- Material options
- PP / specialty nanofibre media
- Specifications
- Confirmed by model and process
Images and specifications refer to the indicated models. Contact us to confirm configuration and suitability.
Construction & operating principle
A CMP depth filter aims to retain unwanted agglomerates and oversized particles while preserving useful abrasive particles. Slurry is not simply dirty water: excessive filtration can alter solids content and particle distribution, affecting polishing. Available media can include PP or specialty nanofibre constructions. Evaluation therefore centres on formulation, particle stability, transport conditions and the process defects being controlled.
Typical uses
- Agglomerate control after slurry preparation or transfer
- Particle management in distribution and recirculation
- Assessment of filtration before the point of use
Compare product approaches
| Selection factor | What to compare |
|---|---|
| Particle target | Separate functional abrasives from the harmful oversized tail rather than treating all solids as contamination. |
| Media mechanism | Depth, membrane and composite structures have different selectivity in actual slurry. |
| Process position | Tank outlets, loops and points of use differ in flow and residence conditions. |
Selection information to confirm
| Category | Depth Cartridges |
|---|---|
| Material options | PP / specialty nanofibre media |
| Filtration objective | Define what to remove and what to retain |
| Rating / Dimensions | Confirm combinations against controlled model specifications |
| Flow / Temperature / Pressure | Specify normal and limiting operating conditions |
| Connections / Seals | Confirm installation interfaces and wetted materials |
| Cleaning / Validation | Confirm the service cycle and acceptance criteria |
These are selection inputs, not verified performance claims for a specific model.
Build a clear application brief
Use the worksheet to collect your operating conditions. Contact us for controlled datasheets, dimensional drawings or validation documents for a specific model.
Product selection worksheet · TXT ↓Request technical documents ↗PRODUCT SERIES
Product series & technical resources
Find a product series around your process requirements.
JPLCP
CMP capsule filters
Graded PP media for oversized-particle control in polishing slurries, offered in depth or pleated configurations.
Specifications & documents ↗
CMPN
CMPN CMP slurry-filter cartridges
For control of oversized particles and agglomerates in CMP slurries, evaluated together with useful-abrasive retention and pressure rise.
Specifications & documents ↗
Keevalid VDKD / VDKR
Keevalid CMP depth filters
Graded PP micro- and nanofibre structures for large-particle control in CMP slurries, available with melt-blown or rolled media.
Specifications & documents ↗
Keevalid II VDKDH / VDKRN
Keevalid II CMP depth filters
Depth and rolled PP structures with revised fibre-layer designs for dirt loading and particle control in CMP slurry filtration.
Specifications & documents ↗
Dualvalid VDP
Dualvalid CMP hybrid-media filters
Outer pleated PP layers and inner graded rolled PP media combine accessible surface area with large-particle capture.
Specifications & documents ↗
CMP-RF
CMP nanofiber wound cartridges
Multiple nanofiber layers form a progressively finer wound structure for polishing slurries.
Specifications & documents ↗Use & maintenance
- 01
Startup
Use slurry-appropriate filling and conditioning to limit air introduction or local concentration changes.
- 02
Operation
Track large-particle counts, solids and pressure together, considering pump shear and residence time.
- 03
Assessment
Combine particle distribution, chemical composition and polishing results instead of seeking the lowest particle count alone.
Product questions
Does a smaller rating always reduce defects?
It may remove useful abrasives or alter formulation, requiring polishing validation.
Can water tests predict slurry life?
Slurry loading and behaviour differ substantially; water data cannot replace actual-fluid trials.
RELATED PRODUCTS
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Yarn / core dependentExplore ↗
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Activated Carbon Cartridges
Define adsorption and particle-filtration goals separately, including contact time, release and throughput requirements.
Activated carbon / compositeExplore ↗