Image source：Cobetter · PDF pp. 27
PRODUCT SERIES / Cobetter
Hydrophilic Nylon 66 media with HDPE or PP hardware for photoresists, developers and other semiconductor chemicals.
Photopex Nylon PPN product image from the Cobetter semiconductor filtration catalogue.
01 / SPECIFICATIONS
| Filter medium | Nylon 66 |
|---|---|
| Support and hardware | HDPE / PP |
| Maximum operating temperature | Cartridge 50°C; HDPE capsule 38°C; PP capsule 40°C/60°C by configuration |
| Maximum forward differential pressure | Cartridge 0.34 MPa @ 25°C |
| Maximum reverse differential pressure | Cartridge 0.27 MPa @ 25°C |
| Filtration area | X1 0.9; X2 1.4; Z2 1.7 m² per 10″; SW44E/NPT42E 2000 cm² |
| Seal material | TEV / EPDM / FFKM (cartridge) |
02 / FEATURES
03 / APPLICATIONS
EXPLORE MORE
Surface-modified PTFE filters for aqueous process chemicals, with PFA hardware and a membrane designed to reduce dewetting.
Specifications & documents ↗
Asymmetric HAPES media with HDPE hardware for particle control in lower-temperature dilute acids, dilute bases and DIW.
Specifications & documents ↗
Hydrophobic PTFE cartridges with PP support for fermentation, tank venting and process gas.
Specifications & documents ↗