Novacise NVS

Novacise chemical filters

Asymmetric HAPES media with PP hardware for dilute acids, dilute bases and DIW in wet etch and clean processes.

01 / SPECIFICATIONS

Filter medium	Hydrophobic / hydrophilic HAPES
Support and hardware	PP
Seal material	TEV / EPDM (cartridge)
Maximum operating temperature	Cartridge 90°C
Maximum forward differential pressure	Cartridge 0.34 MPa @ 25°C
Maximum reverse differential pressure	Cartridge 0.34 MPa @ 25°C
Filtration area	X1 0.8; Z1 1.4; Z2 1.7 m² per 10″

02 / FEATURES

03 / APPLICATIONS

Semiconductor wet etch and cleanDeionized and ultrapure water

Cartridge and capsule operating limits differ; verify the capsule connection and configuration.

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